Water-Cooling Combustion-Type Burner (Hydrogen-Fuel Model)
Blisters Burner H2

Blisters Burner is a new water-cooling combustion-type exhaust gas treatment equipment developed as a successor to our existing models CooL Burner, Little CooL, and Corona Burner.
The burner combusts and decomposes in a highly efficient manner toxic and/or persistent gases such as PFCs emitted from CVD, etching, LED, EPI, GaN, PV, and various other processes while controlling by-products, such as NOX and CO.
Blisters Burner H2 is a product modified from Blisters Burner to run on hydrogen gas instead of conventional fossil fuels.
Depending on the throughput you need, you can select one of three types: Blisters Burner H2 125, 500, and 1000.
*We can also propose air-cooling types that do not use water.
Features
- Zero direct GHG (CO2) emissions from fuel combustion
- Hight-efficie cy H2 burner uses 30-50% less energy than the existing model (fossil-fuel burner)
- Only minor changes needed for modifying the fossil-fueled model, Blisters Burner, into the hydrogen-fueled model, Blisters Burner H2
- Unitization for improved maintainability
- Reduced maintenance cost This model requires fewer replacement parts.
- Water seal bubbling structure reduces the frequency of cleaning and maintenance
- Increased throughput The throughput of this model is 20% higher than that of our existing models.
- Reduced footprint The space required for the installation and maintenance of this model is about 40% smaller than that of our existing models.
- Built-in exhaust suction device (ejector or exhaust fan)
- On-demand operation function provided as a standard feature
- Automatic burner washing function (available as an option)
Treatable Gases (Examples)
Target equipment | Gas types (examples) | |
---|---|---|
LP-CVD, ALD, W-CVD,P-CVD, diffusion furnaces |
Depo | SiH4, NH3, N2O, SiH2Cl2, TEOS, O3, WF6, various precursors, etc. |
CLN | NF3, ClF3, HCl, etc. | |
Various types of etching equipment | HBr, BCl3, Cl2, SiCl4, C4F6, CF4, C2F6, SF6, CHF3, etc. | |
SiC-EPI, GaN-EPI | SiH4, NH3, H2, HCl, C3H8, SiHCl3 |
Specifications
Series | Blisters Burner H2 125 | Blisters Burner H2 500 | Blisters Burner H2 1000 | |
---|---|---|---|---|
Fuels used | H2 | |||
Maximum throughput(slm) | 125 | 500 | 1,000 | |
Number of treatment ports | 1 | 1 - 4 | 1 - 5 | |
Dimensions(mm) | W | 900 | 1,000 | 1,200 |
D | 900 | 1,000 | 1,200 | |
H *1 | 2,000 | 2,000 | 2,000 | |
Maintenance space(mm) | Front | 800 | ||
Rear | 800 | |||
Utilities | Electricity, N2, air, industrial water, O2 *2, exhaust gas, enclosure exhaust gas |
*2 Needed for treating emissions containing persistent gases