Purifier
We are a leading manufacturer of purifiers for nitrogen, oxygen, hydrogen, argon, helium, and ammonia.
We offer a broad range of purification systems, including systems based on normal temperature adsorption,
cryogenic adsorption, and gettering.
Normal temperature adsorption
Removes oxygen, carbon dioxide, carbon monoxide, hydrogen,
water, and other impurities from inert gas by adsorption at
normal temperatures to produce ultra-high purity gas.
Optional specifications for removing hydrocarbons such as methane are also available.
Getter purification (Ar and He)
Removes nitrogen, methane, oxygen, carbon dioxide,
carbon monoxide, water, and other impurities from
noble gas via special getter to produce
ultra-high purity gas.
Optional specifications for removing hydrocarbons are
also available.
Cryogenic purification (H2 and He)
This purifier removes methane and nitrogen in addition to oxygen,
carbon dioxide, carbon monoxide, and water by cryogenic
adsorption using liquid nitrogen.
CO2 purifier
Removes oxygen, water, volatile organic acid (SO2),
volatile base (NH3), cohesive organic matter (decane),
non-cohesive organic matter (toluene), and
flame-retardant (HMDSO) by catalysis and adsorption.
In-line Purifier (LPI)
Removes various types of impurities from specialty gases and
bulk gases by chemical and physical adsorption processes
to produce ultra-high purity gas.
Two types of products are available: the LPI series and
Nanochem series.
Puremate series
Puremate1400
Retaining the high performance and high functionality of the Puremate 1000, it boasts compact design and lower operating costs.
Puremate1100
Puremate 1100 is a low-end model for customers wishing to use small flow rates of high-purity gas.
| Purification | Gases (Flow rates in Nm3/hr are indicated in parentheses.) | ||||||
| Normal temperature adsorption | N2 | Ar | He | O2 | H2 | NH3 |
CO2 |
| (Catalyst + adsorption) | (3～2000) | (3～100) | (3～100) | (2～100) | (3～100) | (6～100) | (100～300) |
| Getter | Ar | He | |||||
| (0.3～30) | (0.3～30) | ||||||
| Cryogenic purification | He | H2 | |||||
| (10～500) | (10～500) | ||||||